Facilities

List of Available Equipment

Low temperature He 3 system (~400 mK)

Magnetic Optic Kerr Effect (MOKE) and Surface Plasmon Resonance (SPR)

Optical Cryostat (temperatures down to 4 K)

Low temperature Cryostat at high magnetic fields (3 Teslas)

Mask Aligner for optical Lithography

UHV Sputtering System (~10^-8 Torr)

UHV Electron beam evaporation system   (~10^-9 Torr)